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	In situ fabrication of graphene nanowalls as active surface-enhanced Raman scattering substrate
	Sun, Tai1; Gu, Feng1,2; Pu, Lichun2; Liu, Xiaohong3; Zhang, Wei1; Yu, Leyong1; Yang, Jun1; Yu, Chongsheng1; Huang, Deping1; Xu, Zhixian1
	2017-10-01
摘要	Graphene-wall (G-wall) nanostructure was directly grown on the surface of copper foil by plasma enhanced chemical vapor deposition (PECVD) method, and then was employed as active G-wall surface-enhanced Raman scattering (GW-SERS) substrate. To investigate the SERS activity of this G-wall substrate, rhodamine 6G was used as a target molecule. And better Raman enhancement ability was observed, compared with the graphene film on the copper foil. Meanwhile, this novel G-wall based GW-SERS substrate not only maintained the high SERS activity, but also could be easily obtained in large scale. Moreover, the substrate could avoid the use of noble metals, self-assembled steps, complicated photolithograph treatments, as well as the graphene transferring processes. And the GW-SERS substrate could provide the high SERS activity and eliminate fluorescence background noise. Hence, this GW-SERS substrate could be potentially applied for detecting trace amount of analytes in future analytical detection fields.
关键词	Graphene Nanowalls In Situ Fabrication Surface-Enhanced Raman Scattering Substrate Analytical Detection
DOI	10.1166/mex.2017.1390
发表期刊	MATERIALS EXPRESS
ISSN	2158-5849
卷号	7期号:5页码:398-404
WOS记录号	WOS:000418002100008
语种	英语