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	Femtosecond Laser Direct Writing of 3D Silica-like Microstructure from Hybrid Epoxy Cyclohexyl POSS
	Fang, Gan1; Cao, Hongzhong1,2; Cao, Liangcheng1,2; Duan, Xuanming1,2
	2018-03-01
摘要	Given the importance of epoxy cyclohexyl polyhedral oligomeric silsesquioxane (epoxy-POSS) as a silica-like hybrid material of optical clarity, high thermal and mechanic stability, the two-photon initiated polymerization of epoxy-POSS using diphenyliodonium hexafluorophosphate as photoacid generators for UV lithography and femtosecond laser direct writing is studied. The hybrid resist exhibits high thermal stability: decomposition temperatures are found at approximate to 350 and 400 degrees C when calcined in air and argon, respectively. The corresponding calcined products are found as silica-like structures with chemical formulas of C1.5SiO3.5 and C5SiO3, evidenced by energy dispersive X-ray analysis (EDX), fourier-transform infrared spectroscopy (FTIR), and elemental analysis. An equation regarding the two-photon polymerized line width as functions of intensity of laser (P-laser) and scanning speed (V) is proposed in describing the effect of Gaussian light on polymerized lines. Experimental verification of the equation is given to prove a nonlinear optical process. Line width with a resolution of 250 nm is achieved on a glass substrate, while the resolution is 400 nm when fabricated on a silicon wafer. 3D structured woodpiles are fabricated and show no volumetric shrinkage upon 300 degrees C calcination in air environment, demonstrating a high thermal stability.
关键词	femtosecond laser direct writing polyhedral oligomeric silsesquioxane two-photon polymerization woodpiles
DOI	10.1002/admt.201700271
发表期刊	ADVANCED MATERIALS TECHNOLOGIES
ISSN	2365-709X
卷号	3期号:3页码:10
收录类别	SCI
WOS记录号	WOS:000427232800009
语种	英语